Principles of plasma discharges and materials processing /
Lieberman, M. A.
Principles of plasma discharges and materials processing / - 2nd ed. - Hoboken, N.J. : Wiley-Interscience, 2005. - xxxv, 757 p. : ill. ;
0471720011
Plasma dynamics.
Thin films
Plasma etching.
Plasma chemistry
MED QC718.5.D9 / L54
Principles of plasma discharges and materials processing / - 2nd ed. - Hoboken, N.J. : Wiley-Interscience, 2005. - xxxv, 757 p. : ill. ;
0471720011
Plasma dynamics.
Thin films
Plasma etching.
Plasma chemistry
MED QC718.5.D9 / L54